e-Ion Plasma Brochure
What is e-Ion Plasma™? - Features of Plasma Brochure - Extremely Wide Area Plasma (with LIP)
e-Ion Plasma™ allows for unique applications of Ions, Electrons, Radiation and hot gases. As a new alternative to electron, laser, induction, and RTP heating methods, MHI's e-Ion Plasma™ uses less energy, produces less noise and is safer than traditional heating methods. All e-Ion Plasma™ devices feature patented technologies developed by MHI.
e-Ion Plasma™ Source | e-Ion Zapper™ Furnace | Gen3 LIP System
e-Ion Plasma™ allows for unique applications of Ions, Electrons, Radiation and hot gases. As a new alternative to electron, laser, induction, and RTP heating methods, MHI's e-Ion Plasma™ uses less energy, produces less noise and is safer than traditional heating methods. All e-Ion Plasma™ devices feature patented technologies developed by MHI.
e-Ion Plasma™ Source | e-Ion Zapper™ Furnace | Gen3 LIP System
The four page ideation color brochure can be printed or viewed on screen by scrolling along the edge.
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Email-Us or Call 513-772-0404 for More Information
MHI (Micropyretics Heaters International Inc.)
750 Redna Terrace
Cincinnati, OH 45215, USA
513-772-0404 Phone
513-672-3333 Fax