Introducing the Rapid e-Ion Plasma Zapper™ Furnace.
12" Wafers. Rapid Steel
Heat Treating. Unparalleled 200K/s Heatup Rate.
non-contact, continuous heating with accurate temperature control in compact
versatile use designs. For knife-edge, wire and cable applications, systems can
provide normalizing, stress relieving, annealing, hardening, curing, surface
melting and coating. Processes can be completed while wire or cable is moving
through the e-Ion Plasma™ environment. This type heating provides rapid high
temperatures necessary to melt and heat treat. Much higher heat up
rate compared to Induction. Easy Maneuverability of parts and
all within 9kW of power - compare price with high power induction heating
machines. Save on energy costs, lost productivity and benefit from higher quality products.
No emissions, very low sound, no water
Are you in rapid-prototyping? Do
you need wide area rapidly heating? Do you need quickness of heating and highly competitive productivity?
(if yes to any of the questions please contact MHI to discuss e-Ion Plasma)
New Technology e-Ion Zapper -
unparalleled temperature uniformity and high heat-up rate
metals, ceramics, semi conductors, composites
Designed for quick heat-up applications at very
high temperatures, from simple heat treatment to complicated profiles of
electronics and materials processing. Extremely uniform temperature zone.
Eurotherm process controller capable of up to 20 programs with 16 segments per
program. RS 232/485 Communications option available to connect to PC. Power
controller featuring double back-to-back phase angle fired SCRs, with current
limit, adjustable soft start, and quick response to control signal. Equipped
with over-temperature control through an independent thermocouple to monitor
The HIPAN™ control panel rests
inside a NEMA enclosure that meets NEC and NFPA requirements for safety and
*SDPM position (custom orders only) controller
handles up to 10 programs with an unlimited number of steps, time delays, and
repetitions. Programmer has a non-volatile memory of 32 KB for over 100,000
hours. Computer interface control system has complete DDE dynamic data exchange
by SCADA/Windows software which provides nine simultaneous communication ports.
The Zapper™ features up to eight thermocouples for monitoring temperature at
Vacuum and atmosphere attachments available. The
Plasma creates its own clean environment in air! Contact MHI soon.